Time Influence on Thickness and Grains for Molybdenum Thin Film
Keywords:Atomic Force Microscopy, DC Magnetron Sputtering, Surface Profile, Thin Film,
AbstractIn this paper, DC magnetron sputtering technique was used to deposit high purity molybdenum (Mo) thin films on blank Si substrate. The deposition condition for all samples has not been changed except for the deposition time in order to study the time influence on the surface morphology of the molybdenum. The surface profiler has been sued to measure the surface thickness. Atomic force microscopy technique was employed to investigate grain structure of Mo thin film. Grains analysis and thickness for all samples show a direct relation with time. The thickness and grain parameters of molybdenum thin films increase with respect to time. Grain area, size, length and perimeter parameters are used in grain analysis.
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