The Effect of pH Solution on Electrodeposit-N-Cu2O Thin Film

Authors

  • Fariza Mohamad Department of Electronic Engineering, Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia, 86400 Parit Raja, Batu Pahat, Johor.
  • Nabiah Zinal Pusat Pengajian Diploma, Universiti Tun Hussein Onn Malaysia, 86400 Parit Raja, Batu Pahat, Johor.
  • Lau Kae Lih Department of Electronic Engineering, Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia, 86400 Parit Raja, Batu Pahat, Johor.
  • Nik Hisyamudin Muhd Nor Faculty of Mechanical and Manufacturing Engineering, Universiti Tun Hussein Onn Malaysia, 86400 Parit Raja, Batu Pahat, Johor.
  • Masanobu Izaki Faculty of Mechanical Engineering,Toyohashi University of Technology, Toyohashi, Japan.

Keywords:

Electrodeposition, n-Cu2O, pH Solution,

Abstract

n-type semiconducting Cu2O thin film was successfully prepared on FTO coated glass substrate using electrodeposition method. The effect of pH solution was studied in order to optimize the deposition parameters of n-Cu2O. The solution was prepared using copper acetate and acid lactic. The pH solution was accurately adjusted using potassium hydroxide and varied from 3.5 until 6.5. The n-Cu2O was successfully deposited at higher pH solution from 5.5 until 6.5. Moreover, it showed excellent structural characteristic and good morphology properties. The Cu2O was adsorbed light at approximately 600 nm corresponding to the bandgap of 2.0 eV. The successful fabrication of n-Cu2O was confirmed and the significant effect of pH solution was observed.

Downloads

Published

2017-04-01

How to Cite

Mohamad, F., Zinal, N., Kae Lih, L., Muhd Nor, N. H., & Izaki, M. (2017). The Effect of pH Solution on Electrodeposit-N-Cu2O Thin Film. Journal of Telecommunication, Electronic and Computer Engineering (JTEC), 9(1-5), 7–10. Retrieved from https://jtec.utem.edu.my/jtec/article/view/1823

Most read articles by the same author(s)