Salehuddin, F., A. F. Roslan, A. Zailan, K. Kaharudin, A. Zain, A. M. A.H., A. Hanim, H. Hazura, S. Idris, and W. H. Mohd Saad. “Analyze Of Process Parameter Variance In 19nm Wsi2/Tio2 NMOS Device Using 2k-Factorial Design”. Journal of Telecommunication, Electronic and Computer Engineering (JTEC), vol. 10, no. 2-7, July 2018, pp. 127-31, https://jtec.utem.edu.my/jtec/article/view/4438.