Salehuddin, F., Roslan, A. F., Zailan, A., Kaharudin, K., Zain, A., A.H., A. M., Hanim, A., Hazura, H., Idris, S. and Mohd Saad, W. H. (2018) “Analyze Of Process Parameter Variance In 19nm Wsi2/Tio2 NMOS Device Using 2k-Factorial Design”, Journal of Telecommunication, Electronic and Computer Engineering (JTEC), 10(2-7), pp. 127–131. Available at: https://jtec.utem.edu.my/jtec/article/view/4438 (Accessed: 21December2024).