SALEHUDDIN, F.; ROSLAN, A. F.; ZAILAN, A.; KAHARUDIN, K.; ZAIN, A.; A.H., A. M.; HANIM, A.; HAZURA, H.; IDRIS, S.; MOHD SAAD, W. H. Analyze Of Process Parameter Variance In 19nm Wsi2/Tio2 NMOS Device Using 2k-Factorial Design. Journal of Telecommunication, Electronic and Computer Engineering (JTEC), [S. l.], v. 10, n. 2-7, p. 127–131, 2018. Disponível em: https://jtec.utem.edu.my/jtec/article/view/4438. Acesso em: 29 mar. 2024.