MAH, S.; AHMAD, I.; KER, P. J.; Z. A., N. F. High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control. Journal of Telecommunication, Electronic and Computer Engineering (JTEC), [S. l.], v. 10, n. 2-6, p. 1–5, 2018. Disponível em: https://jtec.utem.edu.my/jtec/article/view/4361. Acesso em: 21 nov. 2024.