Salehuddin, F., Ahmad, I., Hamid, F., Zaharim, A., Elgomati, H. and Majlis, B. 2010. Impact of Salicide and Source/Drain Implants on Leakage Current and Sheet Resistance in 45nm NMOS Device. Journal of Telecommunication, Electronic and Computer Engineering (JTEC). 2, 1 (Jun. 2010), 35–41.